In the current process technology, fixed piping systems lead to permanently closed systems within the single plants which do not allow the operator to have a
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Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high quality, high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. This reaction is usually performed in LPCVD systems, with either pure silane feedstock, or a solution of silane
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